https://doi.org/10.1051/epjconf/20122900042
Investigation of vanadium and nitride alloys thin layers deposited by PVD
1 Laboratoire de Photovoltaïque (LPV), Technopôle de Borj-Cédria B.P. 95, 2050 Hammam-Lif, Tunisie
2 UR. Mécanique Appliquée, Ingénierie et Industrialisation (M.A.2I), ENIT, BP 37, Le Belvédère, 1002 Tunis, Tunisie
3 Laboratoire Bourguignon des Matériaux et Procédés (LaBoMaP), Centre Arts et Métiers ParisTech de Cluny, Rue Porte de Paris, F-71250 Cluny, France
a e-mail: taher.ghrib@yahoo.fr
In this work we present the technique of magnetron vapor deposition and the effect of several deposition parameters on the structural and morphological properties of prepared thin films. It was noted that the deposition time has an effect on the crystallinity, mechanical properties such as residual stress, roughness surface and the layer composition from target products. Studies were carried out on layers of vanadium (V) and the nitride vanadium (VN).
Key words: PVD / VN / electrical resistivity / roughness / residual stress
© Owned by the authors, published by EDP Sciences, 2012
