Ordered phase formation in Sm-Ni thin film deposited on Cr(100) single-crystal underlayer
1 Faculty of Science and Engineering, Chuo University, 1-13-27 Kasuga, Bunkyo-ku, Tokyo 112-8551, Japan
2 Graduate School of Fine Arts, Tokyo University of the Arts, 12-8 Ueno-koen, Taito-ku, Tokyo 110-8714, Japan
3 Faculty of Engineering, Yamagata University, 4-3-16 Jyonan, Yonezawa 992-8510, Japan
a Corresponding author: firstname.lastname@example.org
Published online: 3 July 2014
Sm17Ni83 (at. %) alloy thin films are prepared on Cr(100) underlayers hetero-epitaxially grown on MgO(100) single-crystal substrates by employing an ultra-high vacuum molecular beam epitaxy system. The effect of substrate temperature on the ordered phase formation is investigated. The films deposited below 300 °C consist of amorphous phase, whereas formation of SmNi5 ordered phase is recognized for the films deposited above 400 °C. The SmNi5 films with ordered phase consist of two types of (110) variant whose c-axes are lying in the film plane and rotated around the film normal by 90° each other. With increasing the temperature from 400 to 500 °C, the long-range order degree increases from 0.65 to 0.80. The ordered film formed at 500 °C shows an in-plane magnetic anisotropy reflecting the magnetocrystalline anisotropy of SmNi5 crystal.
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