Express in-situ measurement of single crystal diamond growth/etching rate in microwave plasma: how to perform multiparametric kinetics study in one working day

V.G. Ralchenko; V.Yu. Yurov; E.V. Bushuev; A.P. Bolshakov; E.E. Ashkinazi; I.A. Antonova; E.V. Zavedeev; A.A. Khomich; V.I. Konov

doi:10.1051/epjconf/201714902001

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EPJ Web of Conferences 149, 02001 (2017)
https://doi.org/10.1051/epjconf/201714902001

Express in-situ measurement of single crystal diamond growth/etching rate in microwave plasma: how to perform multiparametric kinetics study in one working day

V.G. Ralchenko¹^,2^,3, V.Yu. Yurov¹^,2, E.V. Bushuev¹, A.P. Bolshakov¹^,2, E.E. Ashkinazi¹^,2, I.A. Antonova¹^,2, E.V. Zavedeev¹, A.A. Khomich¹^,4 and V.I. Konov¹^,2

¹ General Physics Institute RAS, Moscow, Russia
² National Research Nuclear University MEPhI, Moscow, Russia
³ Harbin Institute of Technology, Harbin, P.R. China
⁴ Institute of Radio Engineering and Electronics RAS, Fryazino, Russia

vg_ralchenko@mail.ru

Published online: 4 August 2017

This article has no abstract.

© The Authors, published by EDP Sciences, 2017

This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.