RF plasma generation in the chamber with the conducting walls
1 Joint Institute for High Temperatures of the Russian Academy of Sciences (JIHT RAS), 125412, Moscow, Russia
2 Moscow Institute of Physics and Technology (MIPT), 141701, Dolgoprudny, Moscow Region, Russia
* Corresponding author: firstname.lastname@example.org
Published online: 23 October 2017
This work is devoted to study of inductively coupled RF discharge within a metal chamber with a diameter of about 1 m and a length of about 2 m in argon gas (RF frequency is 5.28 MHz). The spatial distributions of electron temperature and density depending on the magnetic induction (from 0 to 0.2 T), plasma-forming gas pressure (0.1 − 10 mTorr) and RF power absorbed in the plasma are presented. For fixed gas pressure (6 mTorr) electron temperature decrease with increasing of magnetic field was found.
© The authors, published by EDP Sciences, 2017
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