https://doi.org/10.1051/epjconf/201922402004
Development of the Effective Reaction Model for Diamond Deposition Simulation within the Continuous Media Approach
1
Center for Advanced Studies, Peter the Great St.Petersburg Polytechnic University, RU-195251, St.-Petersburg, Russia
2
CoddanTechnologies LLC, RU-197342, St.-Petersburg, Russia
* e-mail: dimvovich@narod.ru
Published online: 9 December 2019
Three models for diamond growth process by the chemical vapor deposition of methane are proposed. They differ in the degree of detail of the surface reaction description. The most complete model contains the reactions of deposition, etching and insertion. Gas-dynamic simulations have been performed for all those models. The species delivery to the substrate and the contribution from different species to the growth process is analysed. It is shown that different surface reaction models lead to different profiles of the species concentrations in the immediate vicinity of the substrate, thus, the experimental data on the growth rate may give information on the growth mechanism.
© The Authors, published by EDP Sciences, 2019
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
