https://doi.org/10.1051/epjconf/202226603012
Light Scattering from Contamination and Defects - Measurement, Analysis, and Modelling
1 Fraunhofer Institute for Applied Optics and Precision Engineering IOF, 07745 Jena, Germany
2 Institute for Applied Physics, Abbe Center of Photonics, Friedrich-Schiller University, 07745 Jena, Germany
* Corresponding author: tobias.herffurth@iof.fraunhofer.de
Published online: 13 October 2022
Light scattering induced by contamination and defects on optical components can quickly limit the component’s performance. Therefore, imperfection analysis and budgeting are mandatory - but also challenging tasks. On the other hand, imperfections can be elegantly characterized using efficient, robust and non-contact light scattering techniques. This will be demonstrated in this contribution for area covering measurement approaches using laboratory instruments with highest sensitivity as well as elaborated sensor systems that are best suited for extended freeform surfaces. Moreover, the measurement results are used to derive practical imperfection scattering data and models that serve as input to model and predict the imperfection induced scattering on optical system level.
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