https://doi.org/10.1051/epjconf/202226607003
Polycrystalline MoO3 films fabricated by pulsed laser deposition for infrared polarization manipulation
1 Department of Basic and Applied Sciences for Engineering, SAPIENZA, University of Rome, Via A. Scarpa 16, 00161, Roma, Italy
2 Department of Engineering, University of Palermo, Viale delle Scienze, Ed. 9, Palermo, 90128, Italy
3 National Research Council (CNR), Institute of Nanostructured Materials (ISMN), Via Ugo La Malfa 153, Palermo, 90146, Italy
4 Department of Electrical and Computer Engineering, Northwestern University, Evanston, Illinois 60208, United States
* Corresponding author: daniele.ceneda@uniroma1.it
Published online: 13 October 2022
We performed infrared optical characterization of polycrystalline MoO3 films deposited by pulsed laser deposition on fused silica substrates. Several samples have been fabricated using different parameters such as temperature and oxygen pressure. Our analysis shows that under appropriate fabrication conditions it is possible to obtain a dominant α-phase film, with a well-defined, normal to surface (z-axis) orientation. These results are confirmed by reflection spectra performed at 45° incidence angle revealing a strong modulation of the sharp z-phonon Reststrahlen band as a function of the incident field linear polarization.
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