https://doi.org/10.1051/epjconf/202328702008
Aberration compensation in two-dimensional reflective optical systems
1 Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands
2 Signify Research, High Tech Campus 7, 5656 AE, Eindhoven, The Netherlands
* e-mail: s.verma@tue.nl
Published online: 18 October 2023
We present a novel approach to minimize aberrations in imaging systems. The energy distributions at the source and target of an optical system play a crucial role in designing freeform surfaces through illumination optics methodologies. We quantify the on-axis and off-axis aberrations using a merit function that depends on the energy distributions. The minimization of the merit function yields optimal energy distributions, which subsequently enable us to design freeform reflector surfaces that cause the least aberrations. We validate our method by testing it for two configurations, a single-reflector system with a parallel source to a near-field target, and a double-reflector system with a parallel source to a point target.
© The Authors, published by EDP Sciences, 2023
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
