https://doi.org/10.1051/epjconf/202328704026
Patterning of SiO2 interfaces for radiative cooling applications
1 School of Chemistry and Chemical Engineering, Harbin Institute of Technology, Harbin, 150001, PR China
2 European Laboratory for Non-linear Spectroscopy (LENS), University of Florence, Sesto Fiorentino, 50019, Italy
3 Center for Composite Materials and Structure, Harbin Institute of Technology, Harbin, 150001, PR China
4 Istituto Nazionale di Ricerca Metrologica (INRiM), Turin, 10135, Italy
* Corresponding author: l.pattelli@inrim.it
Published online: 18 October 2023
Silicon dioxide (SiO2) is a prominent material for radiative cooling applications due to its negligible absorption at solar wavelengths (0.25-2.5 µm) and exceptional stability. However, at thermal infrared wavelengths, its bulk phonon-polariton band introduces a strong reflection peak inside the atmospheric transparency window (8-13 µm) which is detrimental to its selective emissivity. Herein, we demonstrate scalable strategies for the patterning of ordered and disordered SiO2 metasurfaces enhancing their thermal emissivity and enabling sub-ambient passive cooling under direct sunlight.
© The Authors, published by EDP Sciences, 2023
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
