https://doi.org/10.1051/epjconf/202430902005
Comparison measurements for hybrid evaluation approaches in optical nanometrology
1 Physikalisch-Technische Bundesanstalt, 38116 Braunschweig, Germany
2 Friedrich-Schiller-Universität Jena, Institute of Applied Physics, 07745 Jena, Germany
3 VSL National Metrology Institute, 2629 JA Delft, Netherlands
4 Dansk Fundamental Metrologi A/S, 2970 Hørsholm, Denmark
* Corresponding author: tim.kaeseberg@ptb.de
Published online: 31 October 2024
In the pursuit of closing the gap between nanometrology and nanofabrication, we investigate the use of advanced optical far field methods for sub-wavelength parameter reconstruction. With the goal of establishing a hybrid evaluation scheme connecting different methods and including different information channels, we performed comparison measurements on a silicon line grating sample with buried as well as not buried surface relief lines. To this end, the results of our measurement are in good agreements with each other, and the collected structure data is feasible to be used for hybrid evaluation.
© The Authors, published by EDP Sciences, 2024
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
