https://doi.org/10.1051/epjconf/202430915006
Scaling photonic systems-on-chip production with neural networks
Enablence Technologies Inc., 390 March Road, Ottawa, Ontario, Canada K2K 0G7
* Corresponding author: ksenia.yadav@enablence.com
Published online: 31 October 2024
We describe our use of deep learning to optimize the multi-dimensional parameter space of systems-on-chip as an important step towards the scalable production of photonic solutions and their widespread integration into high-volume applications. The challenges of transitioning between prototype and volume production are highlighted, and the suitability of deep neural networks for navigating the multi-dimensional design space of today’s photonic circuits is discussed. We adopt multi-path neural network architectures to reduce the computational requirements of model training and to mitigate the risk of overfitting. We demonstrate the use of a multi-path neural network to optimize the construction parameters of photonic designs in a high-volume production environment. Lastly, we discuss the advantages of using machine learning not only as a highly capable tool for navigating the multi-dimensional design space of complex systems-on-chip but also as an effective strategy for compensating for fabrication process non-uniformities that are undetectable by standard process metrology instruments.
© The Authors, published by EDP Sciences, 2024
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
