EPJ Web of Conferences 6, 26003 (2010)
https://doi.org/10.1051/epjconf/20100626003

Mechanical characterization of nanostructured thin films at different scales

¹ Institut P’ CNRS - Université de Poitiers - ENSMA, UPR 3346, 86962 Futuroscope, France
² Synchrotron SOLEIL, L'Orme des Merisiers, BP 48, 91192 Gif sur Yvette, France
³ LPMTM, UPR 9001 CNRS, Université Paris-Nord, 93430 Villetaneuse, France
⁴ Laboratoire PIMM, ENSAM, 151, Boulevard de l'Hôpital, 75013 Paris, France
⁵ LMT Cachan, 61 Avenue du Président Wilson 94235 CACHAN Cedex, France

Abstract

The mechanical behaviour of multilayered W/Cu thin films on polyimide substrate has been investigated at different scales and using complementary X-ray techniques and compared to finite element analysis. Mechanical testing has been carried out using a new biaxial tensile machine which allows for testing in controlled biaxial loading condition. This device has been developed for synchrotron measurements at DiffAbs beamline of the French synchrotron radiation facility (SOLEIL, Saint Aubin).