EPJ Web of Conferences 6, 26002 (2010)
https://doi.org/10.1051/epjconf/20100626002

Residual stresses in AlCrN PVD thin films

Institut P’ CNRS - Université de Poitiers - ENSMA, UPR 3346, 86962 Futuroscope, France

Abstract

Residual stresses may affect the mechanical stability of high quality coatings such as Al_1-xCr_xN. In this study, two different physical vapour deposition techniques leading to different residuals stress states have been used for depositing Al_1-xCr_xN coatings varying the chromium content. The structure and residual stress state have been investigated in Al_1-xCr_xN coatings deposited on silicon substrates using X-ray diffraction, curvature measurements and nanoindentation. The obtained results are compared to literature and commented in view of the coating microstructure.