Lithography-free synthesis of nanostructured cobalt on Si (111) surfaces: structural and magnetic properties
1 LSPM (CNRS-UPR 3407), Université Paris 13, 99 avenue Jean-Baptiste Clément, 93430 Villetaneuse, France
2 NILPR, 409, Magurele, JudIlfov, 077125, Bucharest, Romania
3 SATIE, ENS Cachan, 61 Avenue du Président Wilson 94235 Cachan Cedex, France
4 LEREC, Université de Annaba, BP12 – 23000, Algeria.
a Corresponding author: email@example.com
Published online: 3 July 2014
We illustrate the concept of lithography-free synthesis and patterning of magnetic cobalt in the nanometric scale. Our elaboration method allows fabricating 2D architectures of cobalt and cobalt silicide onto silicon (111) surfaces. A continuous cobalt layer of 1, 3 and 10 nm thickness was first deposited by using thermoionic vacuum arc (TVA) technology and then, thermally annealed on vacuum at temperatures from 450° C to 800° C. Surface structure was analyzed by atomic force and field emission-scanning electron microscopies. Above 750° C, regular triangular shape cobalt nanostructures are formed with pattern dimensions varying between 10 and 200 nm. Good control of shape and packing density could be achieved by adjusting the initial thickness and the substrate temperature. Magnetic properties were investigated by means of vibrating sample magnetometer (VSM) technique. The evolution of the coercive field versus packing density and dimensions of the nanostructures was studied and compared to micromagnetic calculations. The observed nanostructures have been modelled by a series of shapes tending to a fractal curve.
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