EPJ Web of Conferences 149, 02013 (2017)
https://doi.org/10.1051/epjconf/201714902013
https://doi.org/10.1051/epjconf/201714902013
Optical emission spectroscopy for diagnosis of diamond growth and etching processes in microwave plasma
1 General Physics Institute RAS, Moscow 119991, Russia
2 National Research Nuclear University MEPhI, Moscow 115409, Russia
3 Harbin Institute of Technology, 150001 Harbin, P.R. China
Published online: 4 August 2017
This article has no abstract.
© The Authors, published by EDP Sciences, 2017
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 4.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
