https://doi.org/10.1051/epjconf/20135918006
Counter-facing plasma guns for efficient extreme ultra-violet plasma light source
1 Department of Energy Sciences, Tokyo Institute of Technology, Nagatsuta 4259, Midori-ku, Yokohama 226-8502, Japan
2 Yokohama Engineering Center, IHI Corporation, Shin-nakaharacho 1, Isogo-ku, Yokohama 235-8501, Japan
a e-mail: khorioka@es.titech.ac.jp
Published online: 15 November 2013
A plasma focus system composed of a pair of counter-facing coaxial guns was proposed as a long-pulse and/or repetitive high energy density plasma source. We applied Li as the source of plasma for improvement of the conversion efficiency, the spectral purity, and the repetition capability. For operation of the system with ideal counter-facing plasma focus mode, we changed the system from simple coaxial geometry to a multi-channel configuration. We applied a laser trigger to make synchronous multi-channel discharges with low jitter. The results indicated that the configuration is promising to make a high energy density plasma with high spectral efficiency.
© Owned by the authors, published by EDP Sciences, 2013
This is an Open Access article distributed under the terms of the Creative Commons Attribution License 2.0, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
