Proceedings

Free Access to the whole issue

EPJ Web of Conferences

Volume 215 (2019)

EOS Optical Technologies

Munich, Germany, June 24-26, 2019
O. Fähnle and A. Vasdekis (Eds.)

Export the citation of the selected articles Export
Select all
Open Access

Statement of Peer review

Published online: 10 September 2019

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 1

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 2

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 3

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 4

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 5

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 6

Manufacturing, Tolerancing and Testing of Optical Systems (MOS) – Session 7: Plenary Session

Joint Session (EOS MOS and SPIE OM) – Measurement of Optical Components I: Asphere and Freeform Measurement, EOS Papers only

Joint Session (EOS MOS and SPIE OM) – Manufacturing, Tolerancing and Testing of Optical Systems (MOS) POSTERS

Optofluidics (OF) – S01: On-Chip Imaging I

Optofluidics (OF) – S02: On-Chip Imaging II

Optofluidics (OF) – S03: Plenary Session (Emerging Topics I)

Optofluidics (OF) – S04: Microsystems

Optofluidics (OF) – S05: Manipulation

Optofluidics (OF) – S06: Emerging Topics II

Optofluidics Posters

For the second time since the beginning of the "QCD@Work" series we have experienced the publication of our proceedings with EPJ Web of Conferences. As in 2014, we are fully satisfied with the efficient publication procedure. We are very grateful to the EPJ Web Conf Editorial board for the excellent job.

Fulvia De Fazio, INFN Sezione di Bari, Italy
On behalf of the Editors of QCD@Work 2016 proceedings, EPJ Web of Conferences vol. 129 (2016)

ISSN: 2100-014X (Electronic Edition)

© EDP Sciences